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- W2012175531 abstract "Abstract The improvement in adhesion of a thin (50 nm) gold film on samples of tantalum sheet with high energy ion irradiation has been studied. Adhesion enhancement was assessed using the scotch tape and scratch testing methods. The dependence of the effect as a function of ion stopping power has been measured using beams of 1H, 4He, 12C, 16O, 19F, 35Cl and 81Br with energies between 1 and 40 MeV. The threshold dose (Dth) to pass the scotch tape test has previously been measured by two groups for this system and found to have a power law dependence on stopping power ( d E d x ), but a large discrepancy in the exponent has been reported (−1.6 and −3.0). The value obtained in the present work is −1.42 ± 0.11 (scotch tape) and −1.48 ± 0.12 (scratch test). The role of sample preparation is discussed." @default.
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- W2012175531 date "1989-12-01" @default.
- W2012175531 modified "2023-09-28" @default.
- W2012175531 title "MeV ion enhanced adhesion in the gold on tantalum system" @default.
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- W2012175531 doi "https://doi.org/10.1016/0168-583x(89)90418-7" @default.
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