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• W2012245497 abstract "In this work, a time-dependent postexposure bake (PEB) simulator is presented by solving a set of reaction–diffusion equations modeling the deprotection reaction of polymers and the diffusion of acids in chemically amplified resists. The simulator is time-dependent in the sense that model parameters including both reaction parameters and diffusion coefficients are treated as time-dependent functions in the entire course of the PEB process. The alternating direction implicit method is utilized to iteratively solve the set of reaction–diffusion equations. An error-control scheme is devised for automatic time-stepping. This PEB simulator is, hence, capable of simulating the effects of the temperature–time history of a wafer. It is then applied to simulate the resist profiles of line/space patterns and contact holes." @default.
• W2012245497 created "2016-06-24" @default.
• W2012245497 creator A5032982865 @default.
• W2012245497 date "2001-10-01" @default.
• W2012245497 modified "2023-09-26" @default.
• W2012245497 title "Simulation of the Postexposure Bake Process of Chemically Amplified Resists by Reaction–Diffusion Equations" @default.
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• W2012245497 doi "https://doi.org/10.1006/jcph.2001.6881" @default.
• W2012245497 hasPublicationYear "2001" @default.
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