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- W2012251976 abstract "The dependence of contact resistivity on the Ge content in Si1–xGex is examinedfor TiW/p+ Si1–xGex interfaces. Measurements are made on contacts with epitaxial Si1–xGex layers either at the surface or buried under a Si cap layer of various thicknesses. The contact resistivity is found to decrease by an order of magnitude with increasing Ge content from 0 to 30 at. %, which is attributed to an increase in the valence band energy of p+ Si1–xGex. The measured contact resistivity is compared with a theoretical model, and the experimental results agree well with the modelled ones." @default.
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- W2012251976 date "2004-01-01" @default.
- W2012251976 modified "2023-10-03" @default.
- W2012251976 title "Variation of Contact Resistivity with Ge in TiW/P+ SiGe Contacts" @default.
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- W2012251976 doi "https://doi.org/10.1088/0031-8949/2004/t114/011" @default.
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