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- W2012350538 abstract "Experimental investigations on the 1:1 line and space resolution of practical x-ray resists have been thoroughly made in Si Ka x-ray lithography. On chlorinated polymethylstyren (CPMS) negative resist, the resolution, determined persistently by swelling, resulted in 0.5 μm line and space in ≈0.4 μm thickness. For novolac-based positive electron resist (NPR), the resolution, determined by the penumbral blurring, led to 0.5 μm line and space in ≈1 μm thickness. In addition, a novel method utilizing the linewidth decrease due to the penumbra was offered which provided a 0.2 μm width NPR line pattern." @default.
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- W2012350538 date "1985-12-01" @default.
- W2012350538 modified "2023-10-18" @default.
- W2012350538 title "Thorough investigations on the resolution of replicated resist patterns in conventional x-ray lithography" @default.
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- W2012350538 doi "https://doi.org/10.1016/0167-9317(85)90074-7" @default.
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