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• W2012367829 endingPage "3150" @default.
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• W2012367829 abstract "Influences of the substrate holder bias voltage V H , the oxygen partial pressure P O2 , and the distance D between the substrate and the target on the superconducting characteristics of Y-Ba-Cu-O thin films were investigated. The optimum bias voltages were from -10 V to -20 V for total gas pressure P =300-500 mTorr. With increasing distance at P =500 mTorr, the critical temperature T c increased and the c-lattice parameter c 0 decreased. However, at D longer than 50 mm, the values of T c and c 0 did not depend on D . These films have the maximum T c of 90 K and the c-lattice parameter ranging from 1.167 to 1.169 nm. These results imply that the sputtering conditions of P O2 ≥300 mTorr, V H of -10 V to -20 V and D >5 cm at 500 mTorr are necessary for fabricating the films having T c of 87-90 K by means of on-axis rf magnetron sputtering having a YBa 2 Cu 3 O z target." @default.
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• W2012367829 date "1993-07-01" @default.
• W2012367829 modified "2023-10-14" @default.
• W2012367829 title "Influence of Sputtering Conditions on the Characteristics of Superconducting Y-Ba-Cu-O Films" @default.
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• W2012367829 doi "https://doi.org/10.1143/jjap.32.3150" @default.
• W2012367829 hasPublicationYear "1993" @default.
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