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- W2013074103 endingPage "1450" @default.
- W2013074103 startingPage "1442" @default.
- W2013074103 abstract "The effects of ion‐implantation on both polysiloxane and silicate spin‐on‐glass thin films were studied and are reported here. We have shown, using various analysis techniques, that the damage induced by the implantation drastically modified the film properties. A pronounced volume shrinkage was observed in polysiloxane films after the implantation and a respective increase in the effective refractive index of the oxide layer was measured. An infrared transmission study of the samples suggests that the ion‐implanted samples have fewer carbon‐based components and less hydrogen than the unimplanted samples. Similar measurements using silicate‐type spin‐on‐glass films have shown only a slight variation of the thickness, the refractive index, and the infrared transmission spectrum. Both material types change their etching characteristics in wet reagents (i.e., acids, bases, solvent, etc.) after ion‐implantation. The etch rate in solutions of the spin‐on materials was lowered after the implant, and occasionally an inhibition period before any etching could be observed. Cross sections of ion‐implanted samples with nonplanar topography were studied by secondary electron microscopy and compared to samples annealed in a conventional furnace or a rapid‐thermal processor. The ion‐implantation modifies the argon plasma sputtering rate of the spin‐on materials. Metal‐isolator‐silicon (MIS) capacitors with spin‐on oxide additionally were tested before and after the implantation and the results are reported and discussed here. Stress characterization indicates that a lower overall internal stress exists in the ion‐implanted films compared to the as‐deposited layers. Based on the results presented, we conclude that the ion‐implantation densifies the spin‐on film and reduces the carbon content in the layer. We suggest that these material modifications are related to the radiation damage induced by the implantation and to a reordering stage of the atomic structure during the implantation process." @default.
- W2013074103 created "2016-06-24" @default.
- W2013074103 creator A5038021090 @default.
- W2013074103 creator A5041681613 @default.
- W2013074103 creator A5048347363 @default.
- W2013074103 date "1993-05-01" @default.
- W2013074103 modified "2023-10-18" @default.
- W2013074103 title "Modification Effects in Ion‐Implanted SiO2 Spin‐on‐Glass" @default.
- W2013074103 doi "https://doi.org/10.1149/1.2221576" @default.
- W2013074103 hasPublicationYear "1993" @default.
- W2013074103 type Work @default.
- W2013074103 sameAs 2013074103 @default.
- W2013074103 citedByCount "5" @default.
- W2013074103 crossrefType "journal-article" @default.
- W2013074103 hasAuthorship W2013074103A5038021090 @default.
- W2013074103 hasAuthorship W2013074103A5041681613 @default.
- W2013074103 hasAuthorship W2013074103A5048347363 @default.
- W2013074103 hasConcept C100460472 @default.
- W2013074103 hasConcept C113196181 @default.
- W2013074103 hasConcept C115196108 @default.
- W2013074103 hasConcept C130472188 @default.
- W2013074103 hasConcept C145148216 @default.
- W2013074103 hasConcept C159985019 @default.
- W2013074103 hasConcept C171250308 @default.
- W2013074103 hasConcept C178790620 @default.
- W2013074103 hasConcept C185592680 @default.
- W2013074103 hasConcept C19067145 @default.
- W2013074103 hasConcept C191897082 @default.
- W2013074103 hasConcept C192562407 @default.
- W2013074103 hasConcept C22423302 @default.
- W2013074103 hasConcept C2779227376 @default.
- W2013074103 hasConcept C2779851234 @default.
- W2013074103 hasConcept C41823505 @default.
- W2013074103 hasConcept C42067758 @default.
- W2013074103 hasConcept C43617362 @default.
- W2013074103 hasConcept C49040817 @default.
- W2013074103 hasConcept C544956773 @default.
- W2013074103 hasConceptScore W2013074103C100460472 @default.
- W2013074103 hasConceptScore W2013074103C113196181 @default.
- W2013074103 hasConceptScore W2013074103C115196108 @default.
- W2013074103 hasConceptScore W2013074103C130472188 @default.
- W2013074103 hasConceptScore W2013074103C145148216 @default.
- W2013074103 hasConceptScore W2013074103C159985019 @default.
- W2013074103 hasConceptScore W2013074103C171250308 @default.
- W2013074103 hasConceptScore W2013074103C178790620 @default.
- W2013074103 hasConceptScore W2013074103C185592680 @default.
- W2013074103 hasConceptScore W2013074103C19067145 @default.
- W2013074103 hasConceptScore W2013074103C191897082 @default.
- W2013074103 hasConceptScore W2013074103C192562407 @default.
- W2013074103 hasConceptScore W2013074103C22423302 @default.
- W2013074103 hasConceptScore W2013074103C2779227376 @default.
- W2013074103 hasConceptScore W2013074103C2779851234 @default.
- W2013074103 hasConceptScore W2013074103C41823505 @default.
- W2013074103 hasConceptScore W2013074103C42067758 @default.
- W2013074103 hasConceptScore W2013074103C43617362 @default.
- W2013074103 hasConceptScore W2013074103C49040817 @default.
- W2013074103 hasConceptScore W2013074103C544956773 @default.
- W2013074103 hasIssue "5" @default.
- W2013074103 hasLocation W20130741031 @default.
- W2013074103 hasOpenAccess W2013074103 @default.
- W2013074103 hasPrimaryLocation W20130741031 @default.
- W2013074103 hasRelatedWork W1988728469 @default.
- W2013074103 hasRelatedWork W2018736071 @default.
- W2013074103 hasRelatedWork W2039034544 @default.
- W2013074103 hasRelatedWork W2041748642 @default.
- W2013074103 hasRelatedWork W2051282158 @default.
- W2013074103 hasRelatedWork W2069888911 @default.
- W2013074103 hasRelatedWork W2121676972 @default.
- W2013074103 hasRelatedWork W2129363264 @default.
- W2013074103 hasRelatedWork W2135748303 @default.
- W2013074103 hasRelatedWork W2239343226 @default.
- W2013074103 hasVolume "140" @default.
- W2013074103 isParatext "false" @default.
- W2013074103 isRetracted "false" @default.
- W2013074103 magId "2013074103" @default.
- W2013074103 workType "article" @default.