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- W2013111563 abstract "Double patterning (DP) has become the most likely candidate to extend immersion lithography to the 32 nm node andbeyond. This paper focuses on experimental results of 32nm half pitch patterning using NSR-S620D, the latest NikonArF immersion scanner. A litho-freeze-litho (LFL) process was employed for this experiment. Experimental results ofline CDU, space CDU, and overlay accuracy are presented. Finally, a budget for pitch splitting DP at the 22 nm halfpitch is presented." @default.
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- W2013111563 date "2010-03-11" @default.
- W2013111563 modified "2023-10-18" @default.
- W2013111563 title "Double patterning lithography study with high overlay accuracy" @default.
- W2013111563 doi "https://doi.org/10.1117/12.846486" @default.
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