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- W2013171489 abstract "Metallic Cr film coatings of <TEX>$1.2{mu}m$</TEX> thickness were prepared by DC magnetron sputter deposition method on c-plane sapphire substrates. The thin Cr films were ammoniated during horizontal furnace thermal annealing for 10-240 min in <TEX>$NH_3$</TEX> gas flow conditions between 400 and <TEX>$900^{circ}C$</TEX>. After annealing, changes in the crystal phase and chemical constituents of the films were characterized using X-ray diffraction (XRD) and energy dispersive X-ray photoelectron spectroscopy (XPS) surface analysis. Nitridation of the metallic Cr films begins at <TEX>$500^{circ}C$</TEX> and with further increases in annealing temperature not only chromium nitrides (<TEX>$Cr_2N$</TEX> and CrN) but also chromium oxide (<TEX>$Cr_2O_3$</TEX>) was detected. The oxygen in the films originated from contamination during the film formation. With further increase of temperature above <TEX>$800^{circ}C$</TEX>, the nitrogen species were sufficiently supplied to the film's surface and transformed to the single-phase of CrN. However, the CrN phase was only available in a very small process window owing to the oxygen contamination during the sputter deposition. From the XPS analysis, the atomic concentration of oxygen in the as-deposited film was about 40 at% and decreased to the value of 15 at% with increase in annealing temperature up to <TEX>$900^{circ}C$</TEX>, while the nitrogen concentration was increased to 42 at%." @default.
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- W2013171489 date "2014-04-01" @default.
- W2013171489 modified "2023-09-26" @default.
- W2013171489 title "Structural Properties of Ammoniated Thin Cr Films with Oxygen Incorporated During Deposition" @default.
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- W2013171489 doi "https://doi.org/10.3740/mrsk.2014.24.4.194" @default.
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