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- W2013180123 abstract "6HSiC MOS capacitors were operated at temperatures above 600K under negative bias. Enhancement of energetically shallow and deep interface states at n/p-type SiCSiO2 structures and of a fixed charge are observed, which can partially be passivated by a hydrogen treatment. The generation and passivation of the fixed charge is explained in the framework of the “negative-bias-temperature instability” originally proposed for Si-based MOS capacitors." @default.
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- W2013180123 date "1999-09-01" @default.
- W2013180123 modified "2023-10-16" @default.
- W2013180123 title "Degradation of 6HSiC MOS capacitors operated at high temperatures" @default.
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- W2013180123 doi "https://doi.org/10.1016/s0167-9317(99)00382-2" @default.
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