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- W2013381152 abstract "Pulsed KrF excimer laser radiation (248 nm) was used to activate copper deposition from Cu(hfac)(TMVS) onto Teflon AF1600. The interface was examined using X-ray photoelectron spectroscopy (XPS) for thicknesses up to several monolayers. We found that Teflon carbons are the only substrate atoms involved in chemical bonding. Cu0 and CuI-hfac were found to be uniformly distributed throughout the deposited film with additional CuI–C closer to the substrate surface." @default.
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- W2013381152 date "1998-04-01" @default.
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- W2013381152 title "Laser-induced metal-organic chemical vapor deposition (MOCVD) of Cu(hfac)(TMVS) on amorphous Teflon AF1600: an XPS study of the interface" @default.
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- W2013381152 doi "https://doi.org/10.1016/s0169-4332(98)00009-9" @default.
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