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- W2013744142 abstract "A thin film formation of MnSi and MnSi1.7 on a silicon substrate through solid phase reaction has been studied, where MnSi1.7 is one of the few semiconducting silicides, while MnSi is a metallic one. The growth process and electronic states of manganese silicides with composition of MnSi and MnSi1.7 are investigated by several methods, including soft X-ray emission spectroscopy." @default.
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- W2013744142 date "1997-04-01" @default.
- W2013744142 modified "2023-09-23" @default.
- W2013744142 title "Preparation of manganese silicide thin films by solid phase reaction" @default.
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- W2013744142 doi "https://doi.org/10.1016/s0169-4332(96)00823-9" @default.
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