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- W2013889690 abstract "A procedure for the chemical vapour deposition of layers of silicon, silicon nitride, and carbon within a field-emission/field-ion microscope is described. The surface topography and work function contrast of the silicon layers is discussed, and a field-induced chemical reaction between a tungsten surface and a silane–ammonia gas mixture is reported.Es wird ein Verfahren beschrieben zur Aufbringung chemischer Schichten aus der Dampfphase auf Silizium, Siliziumnitrid und Kohlenstoff innerhalb eines Feldemissions-/Feldionen-Mikroskops. Die Oberflachentopographie und der Kontrast der Austrittsarbeit von Siliziumschichten wird diskutiert und es wird eine feldinduzierte chemische Reaktion zwischen einer Wolframoberflache und einem Silan–Ammoniak-Gasgemisch berichtct." @default.
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- W2013889690 date "1975-04-16" @default.
- W2013889690 modified "2023-09-27" @default.
- W2013889690 title "Non-metallic surfaces for field-emission and field-ion microscopy" @default.
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- W2013889690 doi "https://doi.org/10.1002/pssa.2210280216" @default.
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