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- W2013906152 abstract "The orientation dependence of the backscattering yield of 1.8-MeV carbon ions has been used to determine the lattice location of group III and V elements implanted into Si and Ge at 30 keV and ∼350°C. It is shown that the lattice location of p-type dopants is affected by the presence of n-type dopants in the substrate. For example, when T1 is implanted alone into Si a large interstitial component is observed. For a ``mixed'' T1 and As implantation, however, the substitutional T1 component is enhanced at the expense of the interstitial component." @default.
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- W2013906152 date "1969-03-15" @default.
- W2013906152 modified "2023-09-23" @default.
- W2013906152 title "INFLUENCE OF <i>n</i>-TYPE DOPANTS ON THE LATTICE LOCATION OF IMPLANTED <i>p</i>-TYPE DOPANTS IN Si AND Ge" @default.
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- W2013906152 doi "https://doi.org/10.1063/1.1652771" @default.
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