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• W2014007714 abstract "Measurements of sheet resistance and Hall coefficient between 0.3 K and 30 K have been used to infer two-dimensional weak localization and hole-hole interaction effects in Si:B delta-doped layers. It is found that the renormalized screening parameter in the interaction theory F* approximately 0.9 for samples of sheet concentrations 1.8*1013 cm-2 to 7.6*1013 cm-2 and is only weakly dependent on carrier concentration, in agreement with theory. The weak localization correction provides evidence for spin-orbit scattering, which appears to become increasingly important as the sheet concentration is increased." @default.
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• W2014007714 date "1992-04-01" @default.
• W2014007714 modified "2023-09-27" @default.
• W2014007714 title "Weak localization and hole-hole interaction effects in silicon-boron delta layers" @default.
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• W2014007714 doi "https://doi.org/10.1088/0268-1242/7/4/029" @default.
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