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- W2014139898 abstract "Sub-resolution assist features (SRAFs) are non-printing features arranged on a mask layout to “assist” the lithographic performance of the lines intended to be printed on the wafer [1]. SRAFs typically are narrow lines located adjacent to the target figure edges. Current practice is to synthesize SRAFs with a rule-based methodology where the assist feature placement is dictated by combinations of feature width and spacing parameters. Optical behavior with off-axis illumination is complex and requires an elaborate set of SRAF synthesis rules. Creating and maintaining a robust set of placement rules guaranteed to work properly for arbitrary configurations is very difficult. Socha, <i>et al</i>, have demonstrated that the optimum configurations for SRAFs can be derived from the aerial image of the target layout configuration [2]. In this paper we show how SRAF synthesis can be optimally implemented in an OPC tool environment, leveraging lithography simulation." @default.
- W2014139898 created "2016-06-24" @default.
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- W2014139898 date "2004-12-06" @default.
- W2014139898 modified "2023-09-23" @default.
- W2014139898 title "Placing assist features in layout using a process model" @default.
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- W2014139898 doi "https://doi.org/10.1117/12.569179" @default.
- W2014139898 hasPublicationYear "2004" @default.
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