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- W2014159910 abstract "Transparent conductive oxide (TCO) thin films of Mo-doped In2O3 (IMO) were prepared on glass substrates by radio frequency magnetron sputtering from the 2 wt% Mo-doped In2O3 ceramic target. The depositions were carried out under an oxygen–argon atmosphere by varying the deposition temperature from 200 °C to 350 °C. The crystal structure and thickness of IMO thin films were characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM). The effects of deposition temperature on the electrical and optical transmittance properties of IMO thin films were investigated by four-point probe Hall system and UV–VIS–NIR spectrophotometer separately. The optimum deposited IMO thin films were obtained with resistivity of 6.9 × 10−4 Ω cm and carrier mobility 45 cm2v−1s−1 at 350 °C. The average optical transmittance of IMO films on glass substrates are over 80% in the near-infrared region." @default.
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- W2014159910 date "2010-08-01" @default.
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- W2014159910 title "Effects of deposition temperature on structure and properties of mo-doped indium oxide by radio frequency magnetron sputtering" @default.
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- W2014159910 doi "https://doi.org/10.1016/j.vacuum.2010.05.016" @default.
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