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- W2014169308 abstract "We present a systematic study of the effect of encapsulation temperature on dopant segregation and electronic transport in Si:P δ-doped layers. We demonstrate that while limited dopant segregation and complete electrical activation can be achieved at room temperature, a δ-doped layer encapsulated at ∼250°C represents the best compromise between high electrical quality (mobility ∼61cm2V−1s−1 and phase coherence length ∼72nm at 4.2K) and minimal dopant segregation. Higher encapsulation temperatures are shown to lead to significant dopant segregation." @default.
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- W2014169308 date "2004-11-22" @default.
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- W2014169308 title "Effect of encapsulation temperature on Si:P δ-doped layers" @default.
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- W2014169308 doi "https://doi.org/10.1063/1.1827940" @default.
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