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- W2014309212 abstract "The formation of thin SiO2 films on Si by thermal oxidation in dry oxygen in the temperature range of 850-1050 degrees C is investigated. The intrinsic stress is determined from ellipsometric measurements as a function of the oxidation temperature and the substrate orientation. The role of stress on the diffusivity of the oxidant and interface reaction is discussed. The deviation from linear-parabolic kinetics of oxidation at intermediate temperatures is ascribed to viscoelastic relaxation of oxide structure accompanied by stress release." @default.
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- W2014309212 title "The role of stress on silicon dry oxidation kinetics" @default.
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