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• W2014337145 abstract "Time-resolved measurements have been performed during dual High Power Impulse Magnetron Sputtering (dual-HiPIMS) with two cathodes in a closed magnetic field configuration. The effect of a delay between subsequent pulses on electron density, mean electron energy, and ion flux to the substrate was investigated by time-resolved diagnostic methods. Two different delays of 15 µs and 500 µs between subsequent pulses were investigated. The dual-HiPIMS system, operated at a repetition frequency f = 100 Hz and duty cycle of 1 %, was equipped with different metallic targets (Ti, Cu). It is shown that a delay between subsequent pulses influences the plasma parameters and can be used to control deposition processes. It was noted that target surfaces (alternately serving as a cathode/anode) are contaminated by sputtered material from the previous pulse which influences the time-evolution of the discharge parameters (© 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)" @default.
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• W2014337145 date "2011-03-01" @default.
• W2014337145 modified "2023-10-17" @default.
• W2014337145 title "Time-Resolved Diagnostics of Dual High Power Impulse Magnetron Sputtering With Pulse Delays of 15 µs and 500 µs" @default.
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• W2014337145 doi "https://doi.org/10.1002/ctpp.201000065" @default.
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