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- W2014381657 abstract "We leverage distinctive chemical properties of the diblock copolymer poly(α-methylstyrene)-block-poly(4-hydroxystyrene) to create for the first time high-resolution selective-area regions of two different block copolymer phase morphologies. Exposure of thin films of poly(α-methylstyrene)-block-poly(4-hydroxystyrene) to nonselective or block-selective solvent vapors results in polymer phase separation and self-assembly of patterns of cylindrical-phase or kinetically trapped spherical-phases, respectively. Poly(4-hydroxystyrene) acts as a high-resolution negative-tone photoresist in the presence of small amounts of a photoacid generator and cross-linker, undergoing radiation-induced cross-linking upon exposure to ultraviolet light or an electron beam. We use lithographic exposure to lock one self-assembled phase morphology in specific sample areas as small as 100 nm in width prior to film exposure to a subsequent solvent vapor to form a second self-assembled morphology in unexposed wafer areas." @default.
- W2014381657 created "2016-06-24" @default.
- W2014381657 creator A5053232971 @default.
- W2014381657 creator A5056123868 @default.
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- W2014381657 date "2009-06-17" @default.
- W2014381657 modified "2023-10-16" @default.
- W2014381657 title "Selective Area Control of Self-Assembled Pattern Architecture Using a Lithographically Patternable Block Copolymer" @default.
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- W2014381657 doi "https://doi.org/10.1021/nn900343u" @default.
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