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- W2014450558 abstract "Chemical treatments of the (111) GaP surface were investigated. The investigations were carried out using scanning electron microscopy, ellipsometry and Schottky barrier characterization. A 1HCl: 1HNO3: 1CH3COOH etchant was developed as the most suitable for polishing etching. It provided damage-free GaP surfaces with minimum residual oxide (18 Å) and nearly ideal Schottky barrier characteristics. A complex chemical treatment was required for the removal of a thick surface layer from the GaP crystals. It consisted of aqua regia etching followed by etching with 1HCl:1HNO3:1CH3COOH, 1HCl:3HNO3:2CH3COOH:3HClO4 or 1K3Fe(CN)6:3KOH:60H2O." @default.
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- W2014450558 date "1981-02-01" @default.
- W2014450558 modified "2023-10-17" @default.
- W2014450558 title "Etching procedures for Gap surfaces" @default.
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- W2014450558 doi "https://doi.org/10.1016/0376-4583(81)90024-8" @default.
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