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- W2014521578 abstract "Members of the family of ilmenite–hematite (1−x)FeTiO3·xFe2O3 have been found to exhibit interesting semiconducting behavior over a wide range of temperatures. Low-voltage varistors were recently produced using ceramic specimens. The objective of this work was to grow and characterize epitaxial films of some members of the family that can be used for fabricating p–n junction devices. Epitaxial films of the (1−x)FeTiO3·xFe2O3 series (x=0, 0.10, 0.20, 0.27, 0.35, 0.45) were grown on (0001) sapphire substrates using pulsed laser deposition. The films are c-axis-oriented and exhibit good epitaxy." @default.
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- W2014521578 date "2002-04-01" @default.
- W2014521578 modified "2023-09-23" @default.
- W2014521578 title "Pulsed laser-deposited ilmenite–hematite films for application in high-temperature electronics" @default.
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- W2014521578 doi "https://doi.org/10.1016/s0040-6090(02)00075-5" @default.
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