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- W2014564366 abstract "Mask aligner lithography is very attractive for less-critical lithography layers and is widely used for LED, display, CMOS image sensor, micro-fluidics and MEMS manufacturing. Mask aligner lithography is also a preferred choice the semiconductor back-end for 3D-IC, TSV interconnects, advanced packaging (AdP) and wafer-level-packaging (WLP). Mask aligner lithography is a mature technique based on shadow printing and has not much changed since the 1980s. In shadow printing lithography a geometric pattern is transferred by free-space propagation from a photomask to a photosensitive layer on a wafer. The inherent simplicity of the pattern transfer offers ease of operation, low maintenance, moderate capital expenditure, high wafers-per-hour (WPH) throughput, and attractive cost-of-ownership (COO). Advanced mask aligner lithography (AMALITH) comprises different measures to improve shadow printing lithography beyond current limits. The key enabling technology for AMALITH is a novel light integrator systems, referred to as MO Exposure Optics® (MOEO). MOEO allows to fully control and shape the properties of the illumination light in a mask aligner. Full control is the base for accurate simulation and optimization of the shadow printing process (computational lithography). Now photolithography enhancement techniques like customized illumination, optical proximity correction (OPC), phase masks (AAPSM), half-tone lithography and Talbot lithography could be used in mask aligner lithography. We summarize the recent progress in advanced mask aligner lithography (AMALITH) and discuss possible measures to further improve shadow printing lithography." @default.
- W2014564366 created "2016-06-24" @default.
- W2014564366 creator A5046008432 @default.
- W2014564366 creator A5050032922 @default.
- W2014564366 creator A5058108406 @default.
- W2014564366 date "2015-03-18" @default.
- W2014564366 modified "2023-09-23" @default.
- W2014564366 title "Advanced Mask Aligner Lithography (AMALITH)" @default.
- W2014564366 cites W1985518538 @default.
- W2014564366 cites W1999727418 @default.
- W2014564366 cites W2013138940 @default.
- W2014564366 cites W2060416629 @default.
- W2014564366 cites W2093186187 @default.
- W2014564366 cites W2501873590 @default.
- W2014564366 doi "https://doi.org/10.1117/12.2085792" @default.
- W2014564366 hasPublicationYear "2015" @default.
- W2014564366 type Work @default.
- W2014564366 sameAs 2014564366 @default.
- W2014564366 citedByCount "0" @default.
- W2014564366 crossrefType "proceedings-article" @default.
- W2014564366 hasAuthorship W2014564366A5046008432 @default.
- W2014564366 hasAuthorship W2014564366A5050032922 @default.
- W2014564366 hasAuthorship W2014564366A5058108406 @default.
- W2014564366 hasConcept C105487726 @default.
- W2014564366 hasConcept C121684516 @default.
- W2014564366 hasConcept C137905882 @default.
- W2014564366 hasConcept C146617872 @default.
- W2014564366 hasConcept C14737013 @default.
- W2014564366 hasConcept C160671074 @default.
- W2014564366 hasConcept C162996421 @default.
- W2014564366 hasConcept C163581340 @default.
- W2014564366 hasConcept C171250308 @default.
- W2014564366 hasConcept C177409738 @default.
- W2014564366 hasConcept C182873914 @default.
- W2014564366 hasConcept C187504802 @default.
- W2014564366 hasConcept C192562407 @default.
- W2014564366 hasConcept C200274948 @default.
- W2014564366 hasConcept C204223013 @default.
- W2014564366 hasConcept C2776326872 @default.
- W2014564366 hasConcept C2779227376 @default.
- W2014564366 hasConcept C41008148 @default.
- W2014564366 hasConcept C41794268 @default.
- W2014564366 hasConcept C49040817 @default.
- W2014564366 hasConcept C53524968 @default.
- W2014564366 hasConcept C70520399 @default.
- W2014564366 hasConcept C78371743 @default.
- W2014564366 hasConcept C94263209 @default.
- W2014564366 hasConceptScore W2014564366C105487726 @default.
- W2014564366 hasConceptScore W2014564366C121684516 @default.
- W2014564366 hasConceptScore W2014564366C137905882 @default.
- W2014564366 hasConceptScore W2014564366C146617872 @default.
- W2014564366 hasConceptScore W2014564366C14737013 @default.
- W2014564366 hasConceptScore W2014564366C160671074 @default.
- W2014564366 hasConceptScore W2014564366C162996421 @default.
- W2014564366 hasConceptScore W2014564366C163581340 @default.
- W2014564366 hasConceptScore W2014564366C171250308 @default.
- W2014564366 hasConceptScore W2014564366C177409738 @default.
- W2014564366 hasConceptScore W2014564366C182873914 @default.
- W2014564366 hasConceptScore W2014564366C187504802 @default.
- W2014564366 hasConceptScore W2014564366C192562407 @default.
- W2014564366 hasConceptScore W2014564366C200274948 @default.
- W2014564366 hasConceptScore W2014564366C204223013 @default.
- W2014564366 hasConceptScore W2014564366C2776326872 @default.
- W2014564366 hasConceptScore W2014564366C2779227376 @default.
- W2014564366 hasConceptScore W2014564366C41008148 @default.
- W2014564366 hasConceptScore W2014564366C41794268 @default.
- W2014564366 hasConceptScore W2014564366C49040817 @default.
- W2014564366 hasConceptScore W2014564366C53524968 @default.
- W2014564366 hasConceptScore W2014564366C70520399 @default.
- W2014564366 hasConceptScore W2014564366C78371743 @default.
- W2014564366 hasConceptScore W2014564366C94263209 @default.
- W2014564366 hasLocation W20145643661 @default.
- W2014564366 hasOpenAccess W2014564366 @default.
- W2014564366 hasPrimaryLocation W20145643661 @default.
- W2014564366 hasRelatedWork W1946880670 @default.
- W2014564366 hasRelatedWork W1980495369 @default.
- W2014564366 hasRelatedWork W2002557126 @default.
- W2014564366 hasRelatedWork W2013234996 @default.
- W2014564366 hasRelatedWork W2014564366 @default.
- W2014564366 hasRelatedWork W2027095012 @default.
- W2014564366 hasRelatedWork W2035734563 @default.
- W2014564366 hasRelatedWork W2078890378 @default.
- W2014564366 hasRelatedWork W4235059344 @default.
- W2014564366 hasRelatedWork W2526528264 @default.
- W2014564366 isParatext "false" @default.
- W2014564366 isRetracted "false" @default.
- W2014564366 magId "2014564366" @default.
- W2014564366 workType "article" @default.