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- W2014674567 abstract "Abstract Dielectric breakdown phenomena of plasma-deposited hexamethyldisiloxane are discussed. We show that the deposition conditions and post-treatment can change the dielectric strength. A lowering of the breakdown field was attributed to reactions with oxygen species during or after deposition." @default.
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- W2014674567 date "1989-03-01" @default.
- W2014674567 modified "2023-09-26" @default.
- W2014674567 title "On the origin of the dielectric breakdown mechanism in plasma-polymerized hexamethyldisiloxane films" @default.
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- W2014674567 doi "https://doi.org/10.1016/0040-6090(89)90729-3" @default.
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