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- W2014749216 abstract "To develop a multilayer Laue lens (MLL), we fabricated depth-graded Mo/Si and MoSi2/Si multilayers with each boundary according to the Fresnel zone configuration. The multilayers were deposited by magnetron sputtering. From the result of SEM image analysis of the multilayer cross sections, MoSi2/Si multilayer had smaller layer-thickness errors than Mo/Si multilayer. In addition, from the result of the focusing test by using 20-keV X-rays, the measured beam size of MoSi2/Si MLL had a small blurring from the diffraction limited beam size. These results suggest that MoSi2/Si multilayer is better suited than Mo/Si multilayer for use as an MLL in hard x-ray nanofocusing." @default.
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- W2014749216 date "2009-09-01" @default.
- W2014749216 modified "2023-09-27" @default.
- W2014749216 title "Mo/Si and MoSi<sub>2</sub>/Si nanostructures for multilayer Laue lens" @default.
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- W2014749216 doi "https://doi.org/10.1088/1742-6596/186/1/012074" @default.
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