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• W2014773277 abstract "Oxygen plasma etching of a series of halogenated polyimides was carried out for low-loss waveguide fabrication by using inductively coupled plasma (ICP). The effects of etching parameters such as ICP power, rf power, and O2 flow rate on the etching rate and etching profile of polymer films were investigated. The increase in the etch rate with the ICP power and the rf power was observed. Both the vertical profile and sidewall roughness were found to be related to the ion energy (dc bias). By optimizing these parameters, a vertical profile and a smooth sidewall were obtained by 500 W of ICP power, 150 W of rf power, 5 mTorr of chamber pressure, and 40 sccm of the O2 flow rate. © 2000 John Wiley & Sons, Inc. J Appl Polym Sci 79: 176–182, 2001" @default.
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• W2014773277 date "2000-01-01" @default.
• W2014773277 modified "2023-10-17" @default.
• W2014773277 title "Evaluation of halogenated polyimide etching for optical waveguide fabrication by using inductively coupled plasma" @default.
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• W2014773277 doi "https://doi.org/10.1002/1097-4628(20010103)79:1<176::aid-app200>3.0.co;2-7" @default.
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