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- W2014776566 abstract "Preannealing in an oxidizing atmosphere only for 10 min and the existence of backside-polycrystalline silicon films during this preannealing are necessary and sufficient to form an asymmetric distribution of oxygen precipitates in the wafer interior. More silicon self-interstitials due to the oxidation migrate into a wafer interior from a front surface than from a back surface, because the backside film prevents silicon self-interstitials from migrating into the wafer interior. Correspondingly, more precipitation nuclei shrink near the front surface than near the back surface." @default.
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- W2014776566 date "1991-04-01" @default.
- W2014776566 modified "2023-09-23" @default.
- W2014776566 title "Asymmetric Distribution of Oxygen Precipitates in Czochralski Silicon Wafers Covered on the Backside with Polycrystalline Silicon Films" @default.
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- W2014776566 doi "https://doi.org/10.1143/jjap.30.l757" @default.
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