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• W2014780708 abstract "Interfacial characterization of ultra low-k film with the layer underneath is very important for reliable manufacturing of ultra low-k film. In this study, we proposed a new application of TOF-SIMS to predict the interfacial behavior of the ultra low-k with the layer underneath. Strong correlation between carbon intensity at the bottom interface with the adhesion energy of the ultra low-k with the layer underneath is observed. We also observed a linear correlation between the quantified carbon peak intensity and the adhesion energy." @default.
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• W2014780708 date "2008-07-01" @default.
• W2014780708 modified "2023-09-22" @default.
• W2014780708 title "Interfacial characterization of ultra low-k film (kappa=2.55) with time of flight secondary ion mass spectrometry (TOF-SIMS)" @default.
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• W2014780708 doi "https://doi.org/10.1109/ipfa.2008.4588208" @default.
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