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- W2014873123 abstract "Thin films of the aluminum oxide (Al2O3)–titanium oxide (TiO2) system including Al2O3, TiO2, and Al2O3/TiO2 were prepared by radio-frequency (r.f.) magnetron sputtering using ceramic targets of Al2O3, TiO2, and Al2O3/TiO2 composites with different Al2O3/TiO2 ratio. These films were studied at different substrate temperatures, r.f. powers, and annealing temperatures. Composition, microstructure, thermomechanical property of internal stress, and mechanical property of scratch adhesion, were evaluated. A thin film with a dielectric constant of 62 and a loss tangent of 0.012 was obtained at 500 °C from a 10/90 target. This thin film remained the high dielectric constant of TiO2, but had an improvement in the dielectric loss tangent. Al2O3-containing films had a higher resistivity and breakdown field, which was improved further by annealing. Optical properties, such as refractive index and optical transmittance, were also investigated." @default.
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- W2014873123 date "2004-07-01" @default.
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- W2014873123 title "Characterization and properties of r.f.-sputtered thin films of the alumina–titania system" @default.
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- W2014873123 doi "https://doi.org/10.1016/j.tsf.2004.02.026" @default.
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