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• W2014992410 abstract "A comparative study of electron emission characteristics was made for thin films of Al2O3 deposited by the techniques of r.f. sputtering, chemical vapour desposition and post-oxidation of vacuum-evaporated aluminum films. A single pusle method was used with a retarding field analyzer for measurement of the yield in secondary electron emission. Relative work functions were determined with respect to gold by a diode gun assembly and the retarding potential method. All measurements were made in an ultrahigh vacuum system. X-ray photoelectron spectroscopy and scanning electron microscopy were used for comparison of the stoichiometry and morphology of the films, and the relative effects of these characteristics on the emission were assessed. The emission characteristics were analyzed semi-empirically by making use of Dionne's theory for secondary electron emission. On the basis of the experimental results, the use of these films in continuing dynodes (for electron multipliers) is proposed. The r.f. sputtered films were found to be the most suitable electron emissive layers." @default.
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• W2014992410 date "1986-08-01" @default.
• W2014992410 modified "2023-09-30" @default.
• W2014992410 title "Characterization of Al2O3 films deposited by various methods" @default.
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• W2014992410 doi "https://doi.org/10.1016/0040-6090(86)90308-1" @default.
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