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- W2015018003 abstract "Abstract The thermal stability and the electrical reliability of HfO 2 films with a blocking layer (BL) of Al 2 O 3 on strained Si 0.8 Ge 0.2 were studied. High-resolution transmission electron microscopy (HRTEM) indicates that BL keeps HfO 2 amorphous after 700 °C annealing treatment. Energy dispersive X-ray spectroscopy (EDS) shows that BL can suppress Si diffusion in HfO 2 films effectively. X-ray photoelectron spectroscopy (XPS) suggests that BL suppresses the growth of HfSiO and GeO x . Electrical measurements show that the reliability of the sample with BL is improved, including high capacitance density, low interface defect density, and small shift of flatband voltage after total-dose 60 Co -ray irradiation." @default.
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- W2015018003 date "2011-08-01" @default.
- W2015018003 modified "2023-09-26" @default.
- W2015018003 title "Effects of Al2O3 on Thermal Stability and Electrical Reliability of HfO2 Film on Strained SiGe" @default.
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- W2015018003 doi "https://doi.org/10.1016/s1875-5372(11)60054-4" @default.
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