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Matches in SemOpenAlex for { <https://semopenalex.org/work/W2015200280> ?p ?o ?g. }

• W2015200280 abstract "A silicon dioxide film on a silicon substrate is the most essential element in semiconductor devices and various advanced materials. We have elucidated the atomic structure of SiO2 films using low-dose scanning transmission electron microscopy (STEM). We have visualized a metastable crystalline SiO2 layer near a silicon substrate, which was not revealed in previous studies probably due to the vitrification caused by electron irradiation. Our experimental results also suggest a crystallographic nature of various surface oxides." @default.
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• W2015200280 date "2012-11-12" @default.
• W2015200280 modified "2023-10-01" @default.
• W2015200280 title "Metastable ultrathin crystal in thermally grown SiO₂ film on Si substrate" @default.
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• W2015200280 doi "https://doi.org/10.1063/1.4768269" @default.
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