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- W2015757935 abstract "A compact laser produced plasma x-ray source radiates 24 Watts average power of 1nm x-rays in 2(pi) steradians. The x-ray power conversion efficiency is 9% from the laser average power focused on the x-ray target. The laser-plasma x-ray source is generated by a 300W compact, diode-pumped, solid-state Nd:YAG laser system. The tabletop laser system is constructed on a 4ft x 8ft optical bench and the laser modules are 1ft high. The total wall-plug power consumption for this laser-produced-plasma x-ray source is 22 kW. The x-ray source is optimized for integration with and x-ray stepper to provide a complete x-ray lithography exposure tool for the manufacture of high speed GaAs devices." @default.
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- W2015757935 date "2001-12-06" @default.
- W2015757935 modified "2023-09-30" @default.
- W2015757935 title "<title>Compact high-power laser-plasma x-ray source for lithography</title>" @default.
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