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- W2015859073 endingPage "3490" @default.
- W2015859073 startingPage "3485" @default.
- W2015859073 abstract "Proximity x-ray lithography is one of the most promising manufacturing technologies for the fabrication of future electronics devices with ground rules of 100 nm and less because of its wide exposure latitude and processing simplicity. However, the ability to make 1× x-ray masks, with high pattern placement accuracy, has continued to be one of the main technical challenges preventing the wide use of this technology by the semiconductor industry. A model has recently been developed to examine the parameters affecting the overall lithographic system overlay performance, such as the mask pattern placement error as well as the error sources from the x-ray aligner. The model treats all of the error sources statistically. The major assumption of the model is that all the error sources are statistically independent. This is a fairly accurate assumption for the error sources under consideration. For example, the mask pattern placement error is and should be independent of the aligner wafer stage stepping errors. Furthermore, the model can simulate error sources that do not follow the normal statistics. The model has three major components: (1) the x-ray aligner machine model that simulates all the major aligner error sources such as mask and wafer alignments, (2) the application parameter component that considers any application-specific setup tool parameters such as the number of wafer alignment marks and the number and location of global alignment sites, and (3) the mask component that accounts for the effects of pattern placement accuracy on alignment marks and overlay metrology targets. A detailed description of the model and the experimental data used to verify its validity will be given. The relative impact of the various subcomponent error contributions on the overall overlay performance will be provided." @default.
- W2015859073 created "2016-06-24" @default.
- W2015859073 creator A5030100618 @default.
- W2015859073 date "1998-11-01" @default.
- W2015859073 modified "2023-10-16" @default.
- W2015859073 title "Overlay modeling for proximity x-ray lithography" @default.
- W2015859073 cites W2095403573 @default.
- W2015859073 doi "https://doi.org/10.1116/1.590482" @default.
- W2015859073 hasPublicationYear "1998" @default.
- W2015859073 type Work @default.
- W2015859073 sameAs 2015859073 @default.
- W2015859073 citedByCount "1" @default.
- W2015859073 crossrefType "journal-article" @default.
- W2015859073 hasAuthorship W2015859073A5030100618 @default.
- W2015859073 hasBestOaLocation W20158590731 @default.
- W2015859073 hasConcept C11413529 @default.
- W2015859073 hasConcept C119599485 @default.
- W2015859073 hasConcept C120665830 @default.
- W2015859073 hasConcept C121332964 @default.
- W2015859073 hasConcept C127413603 @default.
- W2015859073 hasConcept C136085584 @default.
- W2015859073 hasConcept C160671074 @default.
- W2015859073 hasConcept C168167062 @default.
- W2015859073 hasConcept C195766429 @default.
- W2015859073 hasConcept C199360897 @default.
- W2015859073 hasConcept C204223013 @default.
- W2015859073 hasConcept C41008148 @default.
- W2015859073 hasConcept C66018809 @default.
- W2015859073 hasConcept C97355855 @default.
- W2015859073 hasConceptScore W2015859073C11413529 @default.
- W2015859073 hasConceptScore W2015859073C119599485 @default.
- W2015859073 hasConceptScore W2015859073C120665830 @default.
- W2015859073 hasConceptScore W2015859073C121332964 @default.
- W2015859073 hasConceptScore W2015859073C127413603 @default.
- W2015859073 hasConceptScore W2015859073C136085584 @default.
- W2015859073 hasConceptScore W2015859073C160671074 @default.
- W2015859073 hasConceptScore W2015859073C168167062 @default.
- W2015859073 hasConceptScore W2015859073C195766429 @default.
- W2015859073 hasConceptScore W2015859073C199360897 @default.
- W2015859073 hasConceptScore W2015859073C204223013 @default.
- W2015859073 hasConceptScore W2015859073C41008148 @default.
- W2015859073 hasConceptScore W2015859073C66018809 @default.
- W2015859073 hasConceptScore W2015859073C97355855 @default.
- W2015859073 hasIssue "6" @default.
- W2015859073 hasLocation W20158590731 @default.
- W2015859073 hasOpenAccess W2015859073 @default.
- W2015859073 hasPrimaryLocation W20158590731 @default.
- W2015859073 hasRelatedWork W1986113854 @default.
- W2015859073 hasRelatedWork W2040813044 @default.
- W2015859073 hasRelatedWork W2062194672 @default.
- W2015859073 hasRelatedWork W2068280874 @default.
- W2015859073 hasRelatedWork W2077286051 @default.
- W2015859073 hasRelatedWork W2091655237 @default.
- W2015859073 hasRelatedWork W2279895124 @default.
- W2015859073 hasRelatedWork W3130636988 @default.
- W2015859073 hasRelatedWork W3204723757 @default.
- W2015859073 hasRelatedWork W4366254129 @default.
- W2015859073 hasVolume "16" @default.
- W2015859073 isParatext "false" @default.
- W2015859073 isRetracted "false" @default.
- W2015859073 magId "2015859073" @default.
- W2015859073 workType "article" @default.