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Matches in SemOpenAlex for { <https://semopenalex.org/work/W2015957150> ?p ?o ?g. }

• W2015957150 abstract "Abstract We have studied B incorporation during laser-induced CVD of doped a-Si : H. We found the B concentration in the film is B 2 B 6 -flowrate limited rather than controlled by the gas-phase dopant concentration. Widely varying B-incorporation efficiencies reported for B-doped a-Si : H grown by a variety of thermal CVD techniques are summarized and explained." @default.
• W2015957150 created "2016-06-24" @default.
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• W2015957150 date "1987-12-01" @default.
• W2015957150 modified "2023-09-22" @default.
• W2015957150 title "Boron incorporation in hydrogenated amorphous silicon films prepared by chemical vapor deposition" @default.
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• W2015957150 doi "https://doi.org/10.1016/0022-3093(87)90340-1" @default.
• W2015957150 hasPublicationYear "1987" @default.
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