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- W2015981316 abstract "The principal role of silicon-fluorine bonds in the chemical nature of HF-etched Si surfaces has been investigated by angle-resolved X-ray photoelectron spectroscopy. The native oxide growth thickness and the fluorine coverage have been systematically measured as functions of HF concentration, pure water rinse time, air or N 2 +O 2 gas exposure time and gas phase H 2 O concentration. It is shown that the native oxide growth is strongly suppressed by the existence of Si-F bonds of about 0.12 monolayers on the surface. This is explained by a model in which Si-F bonds chemically stabilize the surface reactive sites such as atomic steps as supported by the result of the layer-by-layer oxidation of Si." @default.
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- W2015981316 date "1990-12-01" @default.
- W2015981316 modified "2023-10-18" @default.
- W2015981316 title "The Role of Fluorine Termination in the Chemical Stability of HF-Treated Si Surfaces" @default.
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- W2015981316 doi "https://doi.org/10.1143/jjap.29.l2408" @default.
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