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- W2016014286 abstract "At first we report an intended effect of accelerated nitrogen accumulation at the CVD preoxide interface by N2O oxidation at 800 °C and below, compared with thermally grown preoxide in dry O2 of the same thickness, leading to very light nitridation with a peak concentration Npeak of up to 1 at%. At second we demonstrate the light nitridation with a higher Npeak of 4.5 at% and more at temperatures down to 600 °C by means of NO-oxidation of Si covered with a CVD oxide. Electrical properties are compared with those of a dry O2-RTO preoxide." @default.
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- W2016014286 date "1995-06-01" @default.
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- W2016014286 title "Nitrogen accumulation at thermally grown or chemical vapor deposited oxide on silicon by N2O- or NO-oxidation" @default.
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- W2016014286 doi "https://doi.org/10.1016/0167-9317(95)00031-3" @default.
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