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• W2016026597 abstract "The aim of this paper is to present results of experimental research and find out correlation between structural and optical properties of a-Si:H layers exposed to an influence of ion beam of very low energy. We have characterized the virgin and bombarded layers of a-Si:H by the following techniques: infrared spectroscopy (IR), X-ray diffraction at grazing incidence (XRDGI) and scanning electron microscopy. The XRDGI and IR measurements indicate that amorphous layer contains multiatomic Si–H complexes (as e.g. Si80H20) which are gradually decomposed due to atom/ion impact to the layers. We suppose this is the reason why the amplitude of ∼2000 cm−1 IR maximum considerably increased after the bombardment." @default.
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• W2016026597 date "2002-09-01" @default.
• W2016026597 modified "2023-10-02" @default.
• W2016026597 title "About an influence of Ar ion beam of very low energy on a-Si:H properties" @default.
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• W2016026597 doi "https://doi.org/10.1016/s0042-207x(02)00192-6" @default.
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