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- W2016055611 abstract "Disilicide of rare‐earth metals (Dy, Er, Ho, and Gd) and Y have been formed by reacting the metallic film on both n‐ and p‐type silicons at around 350 °C for Schottky‐barrier height measurement using I‐V technique. A passivation coating of W, or Pt, or both was used to prevent the rare earth from oxidation. Schottky‐barrier heights of about 0.4 eV on n‐Si and 0.7 eV on p‐Si were determined." @default.
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- W2016055611 date "1981-04-15" @default.
- W2016055611 modified "2023-10-16" @default.
- W2016055611 title "Low Schottky barrier of rare‐earth silicide on<i>n</i>‐Si" @default.
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- W2016055611 doi "https://doi.org/10.1063/1.92457" @default.
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