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- W2016159301 abstract "We report field-effect measurements of the density-of-states (DOS) distribution in the last-deposited surface of undoped glow-discharge a-(Si,Ge):H alloy films containing up to 15% Ge. Over the energy range investigated (Ef≤E≤Ef+0.4 eV) the DOS exhibits a peak approximately 0.7 eV below Ec, and the total number of midgap states increases monotonically by a factor of 2 with Ge content. No structure specifically attributable to Ge defect states is seen. These results are interpreted in terms of a diphasic microstructural model of the alloy films." @default.
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- W2016159301 modified "2023-10-18" @default.
- W2016159301 title "Field-effect density of states in <i>a</i>-(Si,Ge):H films" @default.
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- W2016159301 doi "https://doi.org/10.1063/1.337416" @default.
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