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• W2016206978 abstract "Silicon field emitters have been coated with nitrogenated amorphous carbon (a-C:N) in order to enhance the electron emission current. The coating was produced using a helical resonator plasma enhanced chemical vapor deposition system. The a-C:N film is amorphous and hydrogenated with about 30 at % hydrogen. Nitrogen is also included in the amorphous network and reduces the work function by doping. a-C:N coating enhances significantly the emission current of silicon tips." @default.
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• W2016206978 date "1999-03-01" @default.
• W2016206978 modified "2023-09-26" @default.
• W2016206978 title "Enhancement of electron emission from silicon tips by nitrogen doped amorphous carbon coating" @default.
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• W2016206978 doi "https://doi.org/10.1116/1.590629" @default.
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