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• W2016233595 abstract "Indium oxide and indium tin oxide, films suitable for heat mirror applications, have previously been produced by a variety of methods which include sputtering, chemical vapour deposition, gas phase hydrolysis or spraying. We report for the first time the production of these materials by the photolysis of thin films of vacuum-evaporated indium tin triiodide InxSn1−xI3 0·5 ⩽ χ ⩽1) in air at relatively low temperatures (100–150°C). The determined electrical, optical and crystallographic properties of the prepared films were observed to be comparable to those prepared by other methods. Attempts have been made to epitomize preparative conditions that give films with enhanced heat minor properties. Such a film prepared from In0·9Sn0·1I3, with a thickneess of 0·65 μm, has a transmittance of about 90% and sheet resistance of 16 Ω◊−1" @default.
• W2016233595 created "2016-06-24" @default.
• W2016233595 creator A5080035324 @default.
• W2016233595 date "1986-01-01" @default.
• W2016233595 modified "2023-10-16" @default.
• W2016233595 title "Heat mirror characteristics of photolytically produced indium tin oxide thin films" @default.
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• W2016233595 doi "https://doi.org/10.1016/0741-983x(86)90048-2" @default.
• W2016233595 hasPublicationYear "1986" @default.
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