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- W2016237181 abstract "The electrical properties of amorphous GeTe films deposited at room temperature, ion implanted, and melt-quenched have been studied. The activation energy for the mobility gap varies from 0.64, in the melt-quenched, to 0.74 eV, in the as deposited film. In all the types of amorphous, pre-annealing at temperatures below crystallization induces relaxation, increasing the resistance and the mobility gap. Pre-annealing also reduces the nucleation rate for crystallization by a factor up to 4. A model is proposed, describing the competing processes of structural relaxation and crystallization, as governed by a population of sub-critical nuclei formed by medium range ordered regions." @default.
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- W2016237181 date "2013-08-12" @default.
- W2016237181 modified "2023-09-23" @default.
- W2016237181 title "Impact of annealing induced structural relaxation on the electrical properties and the crystallization kinetics of amorphous GeTe films" @default.
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- W2016237181 doi "https://doi.org/10.1063/1.4818520" @default.
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