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- W2016239991 abstract "A high current gaussian E-beam system is described which exhibits superior throughput and pattern dimensional control compared to reported shaped beam systems in the resolution ranges where direct writing is economically feasible. The Waferwriter' system is an ultra-high current density multiple gaussian beam system capable of exposing popular photoresists at higher rates than any reported shaped beam system in the 0.5 to 2μm feature size range. In addition, greater pattern line width control can be achieved than with shaped beam systems due to sharper beam edge gradients. Alignment and overlay are also improved due to the higher signal-to-noise ratio obtained with the brighter electron beam source.© (1983) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only." @default.
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- W2016239991 date "1983-11-07" @default.
- W2016239991 modified "2023-09-23" @default.
- W2016239991 title "<title>Waferwriter: A Process-Compatible Electron Beam Direct Write System</title>" @default.
- W2016239991 doi "https://doi.org/10.1117/12.935094" @default.
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