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• W2016261674 abstract "The surface roughness of polished InP (001) wafers were examined by x-ray reflectivity and crystal truncation rod (CTR) measurements. The root-mean-square roughness and the lateral correlation scale were obtained by both methods. The scattering intensities in the scans transverse to the specular reflection rod were found to contain two components. A simple surface model of surface faceting is proposed to explain the experimental data. The sensitivities of the two methods to the surface structure and the role of the resolution functions in the CTR measurements are discussed." @default.
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• W2016261674 date "1994-10-01" @default.
• W2016261674 modified "2023-10-10" @default.
• W2016261674 title "Determination of surface roughness of InP (001) wafers by x-ray scattering" @default.
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• W2016261674 doi "https://doi.org/10.1063/1.357366" @default.
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