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- W2016265955 abstract "The radicals formed by γ-irradiation of solid polydimethylsiloxanes CH3(—Si—O—)nCH3 and polydimethylsiloxanes containing 20 mol% diphenylsiloxane units were investigated by the sprintrap technique using 2,4,6-tri-t-butylnitrosobenzene (BNB). After irradiation in vacuum at 77 or 293 K the spin adducts of the following radicals could be identified: Si., H3C. and Si-CH.2. The ratio Si./Si-CH.2 increases with temperature. The spin adduct of the H. radical was not detected. Based on the temperature dependence and the lack of H. radicals an ionic mechanism for radical formation is proposed. In the PDMS containing diphenylsiloxane units no spin adducts originating from radicals at the phenyl group were detected. However, in irradiated samples without spintrap after the decay of the radicals produced in the PDMS fraction, small concentrations of the radical Si-phenyl and three radicals of cyclohexadienyl type were found." @default.
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- W2016265955 title "Radical formation in polydimethylsiloxanes and polydimethyldiphenylsiloxanes studied by the ESR spintrap technique" @default.
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- W2016265955 doi "https://doi.org/10.1016/1359-0197(87)90029-4" @default.
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