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• W2016320253 abstract "ZrNxOy thin films were prepared by rf reactive magnetron sputtering. The thermal stability of the coatings was tested in vacuum for an annealing time of 1 h in the temperature range 400–800 °C. Residual stresses originated by the deposition process were partially or almost completely released with the annealing, which is consistent with the X-ray diffraction results. Samples with low oxygen fraction (0.10 < fO2 < 0.22) showed no significant changes in hardness after thermal annealing at 800 °C. For intermediate and high oxygen fractions, an initial decrease in hardness at 600 °C annealing is followed by an inversion at the highest temperatures (700 and 800 °C, respectively), resulting from possible oxide phases crystallization, defect annealing at high temperatures and some extended phase segregations. The increase in the oxygen fraction is followed by a decrease of hardness in the as-deposited samples towards the values of “pure” ZrO2. No significant changes in colour were observed with the annealing." @default.
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• W2016320253 date "2005-10-01" @default.
• W2016320253 modified "2023-10-17" @default.
• W2016320253 title "Structural stability of decorative ZrNxOy thin films" @default.
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• W2016320253 doi "https://doi.org/10.1016/j.surfcoat.2005.02.100" @default.
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