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- W2016334125 abstract "One hundred ninety three-nanometer candidate photoresist materials were synthesized by nitroxide-mediated polymerization (NMP). Statistical copolymerizations of 5-methacryloyloxy-2,6-norboranecarbolactone (NLAM) with 5–10 mol% of controlling co-monomers (which are necessary for controlled polymerizations of methacrylates by NMP with the initiator used) in the feed, such as styrene (ST), p-acetoxystyrene (AcOST), 2-vinyl naphthalene (VN) and pentafluorostyrene (PFS), using the unimolecular BlocBuilder® initiator in 35 wt% dioxane solution at 90 °C were performed. As little as 5 mol% controlling comonomer in the feed was demonstrated to be sufficient to lead to linear evolution of number average molecular weight with respect to conversion up to 50%, and the resulting copolymers had dispersities of ~1.3 in most cases, an attractive feature for reducing line width roughness (LWR) in photoresists. The copolymers generally showed relatively low absorbance at 193 nm, comparable to other 193-nm candidate photoresists reported previously, despite the inclusion of a small amount of the styrenic co-monomers in the copolymer." @default.
- W2016334125 created "2016-06-24" @default.
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- W2016334125 date "2014-02-21" @default.
- W2016334125 modified "2023-10-03" @default.
- W2016334125 title "Synthesis of Narrow Molecular Weight Distribution Norbornene-Lactone Functionalized Polymers by Nitroxide-Mediated Polymerization: Candidates for 193-nm Photoresist Materials" @default.
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- W2016334125 doi "https://doi.org/10.3390/polym6020565" @default.
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