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- W2016349250 abstract "A-Si:H/a-Si 0.2 C 0.8 :H super structures were fabricated by glow discharge method. The barrier layer using a-Si 0.2 C 0.8 :H was typically 40 Å thick. The thickness of the well layer consisting of doped n-type a-Si:H was changed from 17 Å to 100 Å. The construction of super structures was confirmed by X-ray diffraction. Generation of hot electrons using a newly devised super structure was verified experimentally for the first time." @default.
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- W2016349250 title "Hot Electron Conduction in a-Si:H/a-Si<sub>0.2</sub>C<sub>0.8</sub>:H Super Structure" @default.
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- W2016349250 doi "https://doi.org/10.1143/jjap.25.l922" @default.
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