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• W2016404990 abstract "In this paper, we present two key process steps for potential applications in the fabrication of low-cost and high-efficiency ultrathin monocrystalline silicon (mono-Si) solar cells to effectively harvest solar energy. One is to grow an Al2O3 passivation layer on the rear side of an Si wafer by a successive atomic layer deposition (ALD) at room temperature (25 °C). The other is to produce a bio-inspired antireflection structure on the front side of the Si wafer by replicating butterfly wing patterns. The capacitance–voltage measurements reveal that the successive ALD procedure can yield a higher negative charge density at the Al2O3/Si interface relative to the conventional one. The measurement results of quasi-steady-state photoconductance indicate that after annealing, the 25 °C ALD Al2O3 layers reach a similar passivation level to the p-type Si wafers compared to that deposited at 250 °C. With the help of an ALD Al2O3 layer, butterfly wing patterns (Hypochrysops polycletus) are replicated on a PMMA layer which is on an SiO2/Si stack. This work demonstrates the ability for replicating the natural photonic features on Si wafers and other substrates by using nanoimprint." @default.
• W2016404990 created "2016-06-24" @default.
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• W2016404990 date "2011-12-14" @default.
• W2016404990 modified "2023-09-26" @default.
• W2016404990 title "Room temperature atomic layer deposition of Al₂O₃ and replication of butterfly wings for photovoltaic application" @default.
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• W2016404990 doi "https://doi.org/10.1116/1.3669521" @default.
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